Unaxis Plasma-Therm 790 RIE Etch System for Sale
Equipment for sale from Xsys Engineering Inc.
Equipment overview
The Unaxis / Plasma-Therm 790 RIE is a complete, known-working reactive ion etch system configured for 6-inch (150 mm) wafers. The system features a 13.56 MHz RF source and process-gas configuration for SF6, CHF3, CF4, O2, He, Ar, and N2. Suitable for semiconductor, MEMS, R&D, university, and small-scale production environments. The system includes its control interface and equipment documentation. It is currently crated and stored in the San Jose, California area. Contact Xsys Engineering for additional specifications, photographs, availability, and inspection details.
Photos, videos and supporting documents
Explore the system documentation, images, videos and other available supporting information in its Dropbox folder.
View photos, videos and documents in Dropbox
Request specifications and pricing
Contact Xsys Engineering for current availability, condition, configuration, included accessories, inspection and pricing.